会议论文详细信息
24th International Conference on Vacuum Technique and Technology | |
High-power sputtering employed for film deposition | |
Shapovalov, V.I.^1 | |
Saint-Petersburg Electrotechnical University, LETI, Saint-Petersburg, Russia^1 | |
关键词: Film deposition; High power; High power magnetrons; Ion-electron emission; Ion-sound waves; Physical phenomena; Sputtered atoms; | |
Others : https://iopscience.iop.org/article/10.1088/1742-6596/872/1/012024/pdf DOI : 10.1088/1742-6596/872/1/012024 |
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来源: IOP | |
【 摘 要 】
The features of high-power magnetron sputtering employed for the films' deposition are reviewed. The main physical phenomena accompanying high-power sputtering including ion-electron emission, gas rarefaction, ionization of sputtered atoms, self-sputtering, ion sound waves and the impact of the target heating are described.
【 预 览 】
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High-power sputtering employed for film deposition | 292KB | download |