High-power sputtering employed for film deposition

24th International Conference on Vacuum Technique and Technology

Shapovalov, V.I.^1

Saint-Petersburg Electrotechnical University, LETI, Saint-Petersburg, Russia^1

关键词: Film deposition;    High power;    High power magnetrons;    Ion-electron emission;    Ion-sound waves;    Physical phenomena;    Sputtered atoms;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/872/1/012024/pdf
DOI  :  10.1088/1742-6596/872/1/012024

来源: IOP

【 摘 要 】

The features of high-power magnetron sputtering employed for the films' deposition are reviewed. The main physical phenomena accompanying high-power sputtering including ion-electron emission, gas rarefaction, ionization of sputtered atoms, self-sputtering, ion sound waves and the impact of the target heating are described.