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Конденсированные среды и межфазные границы
TSF-MOCVD – a novel technique for chemical vapour deposition on oxide thin films and layered heterostructures
Roy R. Nygaard1  Vadim Yu. Ratovskiy1  Andrey R. Kaul1  Alexander L. Vasiliev2 
[1] Lomonosov Moscow State Univеrsity, 1 Leninskie Gory, Moscow 119991, Russian Federation;National Research Center “Kurchatov University”, 1 pl. Akademika Kurchatova, Moscow 123182, Russian Federation;
关键词: thread-solution feed;    tsf;    mocvd;    epitaxy;    thin films;    heterostructures;   
DOI  :  10.17308/kcmf.2021.23/3531
来源: DOAJ
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