Photonics | |
Monolithically Integrated Ge-on-Si Active Photonics | |
关键词: Ge; GeSi; GeSn; tensile strain; band engineering; integrated silicon photonics; optoelectronics; photodetectors; modulators; lasers; | |
DOI : 10.3390/photonics1030162 | |
来源: mdpi | |
【 摘 要 】
Monolithically integrated, active photonic devices on Si are key components in Si-based large-scale electronic-photonic integration for future generations of high-performance, low-power computation and communication systems. Ge has become an interesting candidate for active photonic devices in Si photonics due to its pseudo-direct gap behavior and compatibility with Si complementary metal oxide semiconductor (CMOS) processing. In this paper, we present a review of the recent progress in Ge-on-Si active photonics materials and devices for photon detection, modulation, and generation. We first discuss the band engineering of Ge using tensile strain, n-type doping, Sn alloying, and separate confinement of Γ
【 授权许可】
CC BY
© 2014 by the authors; licensee MDPI, Basel, Switzerland.
【 预 览 】
Files | Size | Format | View |
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RO202003190024141ZK.pdf | 3693KB | download |