Growth and characterization of III-nitride materials for high efficiency optoelectronic devices by metalorganic chemical vapor deposition

Epitaxial growth;Mocvd;InAlN;Nitride;Led;Thin film;Heterostructures;Epitaxy

Choi, Suk ; Electrical and Computer Engineering

University:Georgia Institute of Technology

Department:Electrical and Computer Engineering

关键词: Epitaxial growth;    Mocvd;    InAlN;    Nitride;    Led;    Thin film;    Heterostructures;    Epitaxy;   

Others  :  https://smartech.gatech.edu/bitstream/1853/45823/1/choi_suk_201212_phd.pdf

美国|英语

来源: SMARTech Repository

【 摘 要 】

Efficiency droop is a critical issue for the Group III-nitride based light-emitting diodes (LEDs) to be competitive in the general lighting application. Carrier spill-over have been suggested as an origin of the efficiency droop, and an InAlN electron-blocking layer (EBL) is suggested as a replacement of the conventional AlGaN EBL for improved performance of LED. Optimum growth condition of InAlN layer was developed, and high quality InAlN layer was grown by using metalorganic chemical vapor deposition (MOCVD).A LED structure employing an InAlN EBL was grown and its efficiency droop performance was compared with a LED with an AlGaN EBL.Characterization results suggested that the InAlN EBL delivers more effective electron blocking over AlGaN EBL. Hole-injection performance of the InAlN EBL was examined by growing and testing a series of LEDs with different InAlN EBL thickness.Analysis results by using extended quantum efficiency model shows that further improvement in the performance of LED requires better hole-injection performance of the InAlN EBL.Advanced EBL structures such as strain-engineered InAlN EBL and compositionally-graded InAlN EBLs for the delivery of higher hole-injection efficiency were also grown and tested.