Fabrication of Efficient, Large Aperture Transmission Diffraction Gratings by Ion-Beam Etching.

Nguyen, H. T. ; Bryan, S. R. ; Britten, J. A. ; Perry, M. D.

Technical Information Center Oak Ridge Tennessee

关键词: Diffraction gratings;    Ion beam etching;    Pulsed power;    Inertial confinement;    Fused silica;   

RP-ID  :  DE200515013515

学科分类：工程和技术（综合）

美国|英语

来源: National Technical Reports Library

【 摘 要 】

We have designed and produced a high-efficiency transmission gratings fabricated in bulk fused silica for in high-power laser systems. These gratings were designed to diffractively compress 1050 nm - 1070 nm light. We have obtained diffracted efficiencies greater than 95% for m = -1 order in a near-Littrow configuration for a 2 diameter substrate. In addition, we have produce a 65 cm diameter bulk fused silica transmission grating that exhibits diffracted efficiency in places greater than 82% for m= -1 order. While we have made significant advances towards developing the ability to produce master gratings at this size, there are still several outstanding technology issues to be addressed.