Investigation of the current resolution limits of advanced EUVresists

Naulleau, Patrick ; Rammeloo, Clemens ; Cain, Jason P. ; Dean, Kim ; Denham, Paul ; Goldberg , Kenneth A. ; Hoef, Brian ; La Fontaine, Bruno ; Pawloski, Adam ; Larson, Carl ; Wallraff, Greg

Lawrence Berkeley National Laboratory

关键词: Masking;    Extreme Ultraviolet Radiation;    36 Materials Science;    Resolution;    Limiting Values;   

DOI  :  10.2172/898285
RP-ID  :  LBNL--60345
RP-ID  :  DE-AC02-05CH11231
RP-ID  :  898285

美国|英语

来源: UNT Digital Library

【 摘 要 】

No abstract prepared.