Transient effects during sputtering of a-C:H surfaces by nitrogen ions

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

卷:286

Article; Proceedings Paper

Dobes, K.¹  Naderer, P.¹  Hopf, C.²  Schwarz-Selinger, T.²  Aumayr, F.¹ 

[1] TU Wien, Assoc EURATOM OAW, Inst Appl Phys, A-1040 Vienna, Austria

[2] EURATOM, Inst Plasmaphys, D-85748 Garching, Germany

关键词: Ion-surface interaction;    Sputtering;    Amorphous carbon films (a-C:H);    Chemical erosion;    Chemical sputtering;    Co-deposition;   

DOI  :  10.1016/j.nimb.2012.01.001

来源: Elsevier

【 摘 要 】

Sputtering of polymer-like amorphous hydrogenated carbon (a-C:H) thin films by 0.5-1 keV N-2(+) molecular ions has been studied in situ and real-time using a highly sensitive quartz crystal microbalance technique. During bombardment of a fresh, plasma-deposited a-C:H layer with nitrogen ions the measured sputtering yield decreases exponentially with ion fluence until a steady state value is reached at a fluence of typically about 3.5 x 10(15) N-2(+) ions per cm(2). A chemical sputtering mechanism has to be considered in addition to physical sputtering to explain the observed steady state sputtering values. Simulations based on the code TRIDYN, which take into account a change of surface composition due to implantation and erosion, are performed to understand the transient development of sputtering yields. (c) 2012 Elsevier B.V. All rights reserved.

【 授权许可】

Free