Ti-Cr-Al-O Thin Film Resistors.

Jankowski, A. F. ; Hayes, J. P.

Technical Information Center Oak Ridge Tennessee

关键词: Ceramics;    Resistors;    Coatings;    Sputtering;    Targets;   

RP-ID  :  DE200415006122

学科分类：工程和技术（综合）

美国|英语

来源: National Technical Reports Library

【 摘 要 】

Thin films of Ti-Cr-Al-O are produced for use as an electrical resistor material. The films are rf sputter deposited from ceramic targets using a reactive working gas mixture of Ar and O(sub 2). Vertical resistivity values from 10(sup 4) to 10(sup 10) Ohm-cm are measured for Ti-Cr-Al-O films. The film resistivity can be design selected through control of the target composition and the deposition parameters. The Ti-Cr-Al-O thin film resistor is found to be thermally stable unlike other metal-oxide films.