科技报告详细信息
Ti-Cr-Al-O Thin Film Resistors.
Jankowski, A. F. ; Hayes, J. P.
Technical Information Center Oak Ridge Tennessee
关键词: Ceramics;    Resistors;    Coatings;    Sputtering;    Targets;   
RP-ID  :  DE200415006122
学科分类:工程和技术(综合)
美国|英语
来源: National Technical Reports Library
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【 摘 要 】
Thin films of Ti-Cr-Al-O are produced for use as an electrical resistor material. The films are rf sputter deposited from ceramic targets using a reactive working gas mixture of Ar and O(sub 2). Vertical resistivity values from 10(sup 4) to 10(sup 10) Ohm-cm are measured for Ti-Cr-Al-O films. The film resistivity can be design selected through control of the target composition and the deposition parameters. The Ti-Cr-Al-O thin film resistor is found to be thermally stable unlike other metal-oxide films.
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