Final report for ER54440, ''Measurement and modeling of low energy (910 to 1000 eV) sputtering and reflection''

Ruzic, David N.

University of Illinois, Urbana, IL (United States)

关键词: 70 Plasma Physics And Fusion Technology;    Sputtering;    Reflection;    Progress Report;    Simulation;   

DOI  :  10.2172/771262
RP-ID  :  DOE/ER/54440-1
RP-ID  :  FG02-97ER54440
RP-ID  :  771262

美国|英语

来源: UNT Digital Library

【 摘 要 】

This report is a compilation of the three annual progress reports. All detail can be found in the refereed publications enumerated within.