Macroscopic parameters of the interaction of an Ar+ ion beam with a Si pitch grating

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

卷:278

Article

Bizyukov, Ivan²  Mutzke, Andreas¹  Mayer, Matej³  Langhuth, Hagen³  Krieger, Karl³  Schneider, Ralf⁴ 

[1] EURATOM, Max Planck Inst Plasmaphys, D-17491 Greifswald, Germany

[2] Kharkov Natl Univ, Fac Phys & Technol, UA-61108 Kharkov, Ukraine

[3] EURATOM, Max Planck Inst Plasmaphys, D-85748 Garching, Germany

[4] Ernst Moritz Arndt Univ Greifswald, Inst Phys, D-17489 Greifswald, Germany

关键词: SDTrimSP-2D;    Sputtering;    Reflection;    Roughness;    Ion-surface interactions;   

DOI  :  10.1016/j.nimb.2012.01.038

来源: Elsevier

【 摘 要 】

A Si pitch grating has been exposed to a 6 key Ar+ ion beam at normal angle of incidence as well as at angles of 35 degrees both parallel and perpendicular to the structure. Sputtering of the grating has been observed experimentally by Rutherford back-scattering; the bombardment has been simulated by the SDTrimSP-2D code. The numerical simulations show reasonable agreement with experimental results. A pronounced anisotropy effect has been observed comparing the sputtering of the grating parallel and perpendicular to the structure. (C) 2012 Elsevier B.V. All rights reserved.

【 授权许可】

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