Investigation of microstructure and properties of magnetron sputtered Zr-Si-N thin films with different Si content

SURFACE & COATINGS TECHNOLOGY

卷:353

Article; Proceedings Paper

Silva Neto, P. C.¹  Freitas, F. G. R.¹  Fernandez, D. A. R.¹  Carvalho, R. G.¹  Felix, L. C.¹  Terto, A. R.¹  Hubler, R.²  Mendes, F. M. T.³  Silva Junior, A. H.⁴  Tentardini, E. K.¹ 

[1] Univ Fed Sergipe, BR-49100000 Sao Cristovao, SE, Brazil

[2] Pontificia Univ Catolica Rio Grande do Sul PUC RS, Av Ipiranga 6681, Porto Alegre, RS, Brazil

[3] Inst Nacl Tecnol, Av Venezuela 82, Rio De Janeiro, RJ, Brazil

[4] Univ Fed Rio Grande do Sul, Av Paulo Gama 110, Porto Alegre, RS, Brazil

关键词: Magnetron sputtering;    Thin films;    Zr-Si-N;    XPS analysis;    Oxidation;    Nanohardness;   

DOI  :  10.1016/j.surfcoat.2018.07.106

来源: Elsevier

【 摘 要 】

Zr-Si-N thin films with varying silicon content were deposited by reactive magnetron sputtering in order to investigate the effect of Si content in microstructure, morphology, mechanical properties and oxidation resistance of the coatings. Characterizations were carried out using RBS, GAXRD, XPS, nanohardness, SEM and oxidation tests. Silicon content was set between 0 and 15 at.%. GAXRD results indicate peak intensity reduction and broadening increase due silicon nitride segregation, which is responsible for grain size reduction, reaching magnitudes lower than 10 nm, calculated by Scherrer. XPS confirmed the presence of compounds like ZrN and Si3N4. ZrN film is almost fully oxidized at 773 K, while films with high silicon content maintain ZrN grains stable at 973 K. Silicon addition to ZrN provided an increment in hardness values of 32% and also increased H-3/E-2 ratio.

【 授权许可】

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