Nitrogen-doped bcc-Cr films: Combining ceramic hardness with metallic toughness and conductivity

SCRIPTA MATERIALIA

卷:122

Article

Greczynski, G.¹  Lu, J.¹  Tengstrand, O.¹  Petrov, I.^1,2,3,4  Greene, J. E.^1,2,3,4  Hultman, L.¹ 

[1] Linkoping Univ, Dept Phys IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden

[2] Univ Illinois, Dept Mat Sci, Urbana, IL 61801 USA

[3] Univ Illinois, Dept Phys, Urbana, IL 61801 USA

[4] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA

关键词: CrN;    Thin films;    Toughness;    Resistivity;    Magnetron sputtering;    HIPIMS;    Transition-metal nitrides;    Ion mass spectrometry;   

DOI  :  10.1016/j.scriptamat.2016.05.011

来源: Elsevier

【 摘 要 】

We report the first results on nanostructured N-doped bcc-Cr films exhibiting the unique combination of ceramic hardness with metallic toughness and electrical conductivity at unexpectedly low N concentrations, similar to 5 at%. The Cr:N films are deposited at 200 degrees C in N-2/Ar mixtures by high-power pulsed magnetron sputtering using tunable time-domain control of Cr+ and Cr2+ ion fluxes incident at the film growth surface. Subplanted N atoms impede annealing of metal-ion induced point defects and hinder bcc-Cr grain growth, resulting in a material with a nearly isotropic nanostructure and atomically smooth surface, rather than typical Cr:N solid solutions consisting of faceted microcolumns. (C) 2016 Elsevier Ltd. All rights reserved.

【 授权许可】

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