Low resistivity amorphous carbon-based thin films employed as anti-reflective coatings on copper

THIN SOLID FILMS

卷:712

Article

Crespi, Angela Elisa¹  Ballage, Charles¹  Hugon, Marie Christine¹  Robert, Jacques¹  Lundin, Daniel^1,2  Vickridge, Ian³  Alvarez, Jose⁴  Minea, Tiberiu¹ 

[1] Univ Paris Saclay, Lab Phys Gaz & Plasmas, CNRS, LPGP, F-91405 Orsay, France

[2] Linkoping Univ, Plasma & Coatings Phys Div, IFM, SE-58183 Linkoping, Sweden

[3] Sorbonne Univ, INSP, Inst Nanosci Paris, Case 840,4 Pl Jussieu Barre 1222, F-75005 Paris, France

[4] Univ Paris Saclay, Sorbonne Univ, CNRS, Genie Elect & Elect Paris Saclay,GeePS, F-91192 Gif Sur Yvette, France

关键词: Amorphous carbon;    Stainless steel;    Thin films;    Anti-reflective;    Resistivity;    Direct-current magnetron sputtering;   

DOI  :  10.1016/j.tsf.2020.138319

来源: Elsevier

【 摘 要 】

Amorphous carbon-based coatings deposited on copper substrates by magnetron sputtering at different target-to -substrate distances were investigated. Films deposited at short distances as 2 cm presented the best results in terms of morphology, density, and resistivity. Ultraviolet near-infrared range spectrometry measurements determined total reflectance and ellipsometry, extinction coefficient, refraction index, and pseudo bandgap. Amorphous carbon films of 150 nm deposited at 2 cm reduced the total reflectance by up to 60 +/- 5% in the near-infra-red range when compared to pure copper films. The addition of Fe* boosts the absorption of the coating reducing the total reflectance by up to 70 +/- 5% in near-infrared. (Fe*: deposited from stainless-steel target used in direct-current magnetron sputtering). Also, Fe* reduces the electrical resistivity by a factor of 100 compared to that of pure amorphous carbon films. The reduction in total reflectance induced by the presence of the amorphous carbon-based films on copper depends, as expected, on light penetration depth and the absorption coefficient.

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