Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films

Materia

article

Jonh Yago Erikson Santos¹  André Romão Terto¹  Daniel Angel Ramirez¹  Júlio César Valeriano dos Santos¹  Beatriz dos Santos Silva Brito¹  Luís Fernando Sabino¹  Iago Lemos Dias¹  Roberto Hübler²  Eduardo Kirinus Tentardini¹ 

[1] Universidade Federal de Sergipe;Pontifícia Universidade Católica do Rio Grande do Sul

关键词: Thin films;    Magnetron sputtering;    Tantalum nitride;    Nanohardness;    High temperature oxidation;   

DOI  :  10.1590/S1517-707620210004.1311

学科分类：工程和技术（综合）

来源: Universidade Federal do Rio de Janeiro * Coordenacao dos Programas de Pos-Graduacao de Engenharia

【 摘 要 】

Ta1-xZrxN thin films were deposited by reactive magnetron sputtering aiming to investigate the influence of zirconium addition on the microstructure, hardness and high temperature oxidation resistance of the coatings. GAXRD showed that all Ta1-xZrxN thin films maintained ZrN crystalline structure, forming a TaZrN solid solution. Zr incorporation did not alter hardness values of Ta1-xZrxN coatings, however, promoted significant improvements in the oxidation resistance when compared to pure TaN thin films.

【 授权许可】

CC BY