Influence of pulsed-substrate bias duty cycle on the microstructure and defects of cathodic arc-deposited Ti1-xAlxN coatings

SURFACE & COATINGS TECHNOLOGY

卷:419

Article

Salamania, J.¹  Johnson, L. J. S.^1,2  Schramm, I. C.²  Calamba, K. M.²  Boyd, R.¹  Bakhit, B.³  Rogstrom, L.¹  Oden, M.¹ 

[1] Linkoping Univ, Dept Phys Chem & Biol IFM, Nanostruct Mat, SE-58183 Linkoping, Sweden

[2] Sandvik Coromant, SE-12679 Stockholm, Sweden

[3] Linkoping Univ, Dept Phys Chem & Biol IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden

关键词: Coatings;    Ti-Al-N;    Pulsed-substrate bias;    Duty cycle;    Cathodic arc;   

DOI  :  10.1016/j.surfcoat.2021.127295

来源: Elsevier

【 摘 要 】

The influence of pulsed substrate bias duty cycle on the growth, microstructure, and defects of Ti1-xAlxN coatings grown by cathodic arc deposition was investigated. Ti1-xAlxN coatings of varying compositions (x = 0.56, 0.38, 0.23) were deposited on cemented carbide substrates with 10, 25, 50, and 95% duty cycles of 50 V pulsed-bias under 10 Pa of pure N-2 gas. Coatings grown at low duty cycles (10 and 25%) showed strongly textured, underdense coatings with facetted columns and low amount of lattice defects. Applying higher duty cycles (50 and 95%) produced coatings that have denser microstructures, less preferred orientation, increasing compressive stresses and increased lattice defect densities. Our study elucidates how duty cycle variation not only changes the overall average energy supplied at the growth front but also kinetically influences the coating growth and thus microstructure and defect structure.

【 授权许可】

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