Separated Type Atmospheric Pressure Plasma Microjets Array for Maskless Microscale Etching

Micromachines

Man Zhang¹  Yichuan Dai¹  Qiang Li¹  Li Wen¹  Jiaru Chu¹  Hai Wang² 

[1] Department of Precision Machinery and Instrumentation, University of Science and Technology of China, Hefei 230026, China;School of Mechanical and Automotive Engineering, Anhui Polytechnic University, Wuhu 241000, China;

关键词: atmospheric pressure plasma microjets array;    maskless etching;    photoresist;    MEMS;    separation design;    parallel processing;   

DOI  :  10.3390/mi8060173

来源: DOAJ

【 摘 要 】

Maskless etching approaches such as microdischarges and atmospheric pressure plasma jets (APPJs) have been studied recently. Nonetheless, a simple, long lifetime, and efficient maskless etching method is still a challenge. In this work, a separated type maskless etching system based on atmospheric pressure He/O2 plasma jet and microfabricated Micro Electro Mechanical Systems (MEMS) nozzle have been developed with advantages of simple-structure, flexibility, and parallel processing capacity. The plasma was generated in the glass tube, forming the micron level plasma jet between the nozzle and the surface of polymer. The plasma microjet was capable of removing photoresist without masks since it contains oxygen reactive species verified by spectra measurement. The experimental results illustrated that different features of microholes etched by plasma microjet could be achieved by controlling the distance between the nozzle and the substrate, additive oxygen ratio, and etch time, the result of which is consistent with the analysis result of plasma spectra. In addition, a parallel etching process was also realized by plasma microjets array.

【 授权许可】

Unknown