Evaluation of microlithographic performance of `deep UV’ resists: Synthesis, and 2D NMR studies on alternating `high ortho’ novolak resins

Journal of Chemical Sciences

S V Eswaran1³  P Raghunathan¹  Maneesh Sharma³  Anant A Naik² 

[1] National Brain Research Centre, Manesar 122 050, India$$;Solid State Physics Laboratory, Lucknow Road, Delhi 110 054, India$$;St. Stephen’s College, University of Delhi, Delhi 110 007, India$$

关键词: Novolak resins;    2D-NMR;    photoresist;    lithography;    microstructure.;   

DOI  :  

来源: Indian Academy of Sciences

【 摘 要 】

Lithographic evaluation of a `deep UV’ negative photoresist is discussed along with the synthesis of an alternating `high-ortho’ novolak resin. 2-D NMR studies (COSY, NOESY, HSQC, HMBC) on this resin are also discussed.

【 授权许可】

Unknown