期刊论文详细信息
Journal of Chemical Sciences | |
Evaluation of microlithographic performance of `deep UV’ resists: Synthesis, and 2D NMR studies on alternating `high ortho’ novolak resins | |
S V Eswaran13  P Raghunathan1  Maneesh Sharma3  Anant A Naik2  | |
[1] National Brain Research Centre, Manesar 122 050, India$$;Solid State Physics Laboratory, Lucknow Road, Delhi 110 054, India$$;St. Stephen’s College, University of Delhi, Delhi 110 007, India$$ | |
关键词: Novolak resins; 2D-NMR; photoresist; lithography; microstructure.; | |
DOI : | |
来源: Indian Academy of Sciences | |
【 摘 要 】
Lithographic evaluation of a `deep UV’ negative photoresist is discussed along with the synthesis of an alternating `high-ortho’ novolak resin. 2-D NMR studies (COSY, NOESY, HSQC, HMBC) on this resin are also discussed.
【 授权许可】
Unknown
【 预 览 】
Files | Size | Format | View |
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RO201912040508362ZK.pdf | 305KB | download |