Digital projection photochemical etching for gray-scale semiconductor applications

Digital projection;photochemical etching;gray-scale;3-dimensional;semiconductor;optoelectronics;photonics;fabrication;lithography;micro-electro-mechanical systems (MEMS)

Wang, Kaiyuan ; Goddard ; Lynford L.

关键词: Digital projection;    photochemical etching;    gray-scale;    3-dimensional;    semiconductor;    optoelectronics;    photonics;    fabrication;    lithography;    micro-electro-mechanical systems (MEMS);   

Others  :  https://www.ideals.illinois.edu/bitstream/handle/2142/73004/Kaiyuan_Wang.pdf?sequence=1&isAllowed=y

美国|英语

来源: The Illinois Digital Environment for Access to Learning and Scholarship

【 摘 要 】

In the contemporary semiconductor industry, with the ever-growing demand for smaller, denser, and newer device features, various industrial and academic research groups across the world are looking beyond the conventional planar lithography and fabrication methods for semiconductor materials. The rapidly evolving domain of 3-dimensional and gray-scale semiconductor device fabrication paves the way for a wide range of revolutionary techniques, innovative applications, and promising products.This thesis presents digital projection photochemical etching, a novel and dynamic semiconductor fabrication technique that achieves a 3-dimensional structure in a single etch step. This technique utilizes a commercial digital projector to focus a substantially de-magnified image beam pattern onto the semiconductor sample, where the projected image itself is used to catalyze and define the etching. The discussion begins with a thorough introduction and literature review to cover the fundamental mechanisms behind the technique of photochemical etching. This is followed by an in-depth explanation of the methodology of experimental design and setup configuration. Subsequently, the thesis comprehensively describes the fabrication of various novel structures and devices using digital projection photochemical etching, demonstrating this technique’s resolution, dynamics, and ability to integrate with higher-resolution lithography methods while preserving the unique gray-scale feature control.