Nanoimprint Lithography with≤60 nm Overlay Precision

Wu, Wei ; Walmsley, Robert G. ; Li, Wen-Di ; Li, Xuema ; Williams, R. Stanley

HP Development Company

关键词: nanoimprint;    overlay;    lithography;   

RP-ID  :  HPL-2012-6

学科分类：计算机科学（综合）

美国|英语

来源: HP Labs

【 摘 要 】

Nanoimprint lithography (NIL) is a high-resolution, high-throughput and cost-effective nano-patterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of≤60 nm.