期刊论文详细信息
Modern Electronic Materials
Research of acceptor impurity thermal activation in GaN: Mg epitaxial layers
Rauf Kh. Akchurin1  Damir R. Sabitov2  Aleksandr V. Mazalov2  Aleksandr A. Marmalyuk2  Vladimir A. Kureshov2  Anatoliy A. Padalitsa2 
[1] Moscow State University of Fine Chemical Technologies, 86 Vernadsky Ave., Moscow 119571, Russia;Sigm Plus Co., 3 Vvedenskogo Str., Moscow 117342, Russia;
关键词: Gallium nitride;    GaN;    MOCVD;    Metal-organic chemical vapor deposition;    Rapid thermal annealing;    Magnesium bis-cyclopentadienyl;    (Cp2Mg);    Doping;    p-type;   
DOI  :  10.1016/j.moem.2016.09.003
来源: DOAJ
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