Large-area metasurface on CMOS-compatible fabrication platform: driving flat optics from lab to fab

Nanophotonics

article

Nanxi Li¹  Yuan Hsing Fu¹  Shiyang Zhu¹  Navab Singh¹  Zhengji Xu¹  Yuan Dong¹  Ting Hu¹  Qize Zhong¹ 

[1] Institute of Microelectronics, Agency for Science, Technology and Research (A*STAR)

关键词: large area;    metasurface;    flat optics;    lithography;   

DOI  :  10.1515/nanoph-2020-0063

学科分类：社会科学、人文和艺术（综合）

来源: De Gruyter

【 摘 要 】

A metasurface is a layer of subwavelength-scale nanostructures that can be used to design functional devices in ultrathin form. Various metasurface-based optical devices – coined as flat optics devices – have been realized with distinction performances in research laboratories using electron beam lithography. To make such devices mass producible at low cost, metasurfaces over a large area have also been defined with lithography steppers and scanners, which are commonly used in semiconductor foundries. This work reviews the metasurface process platforms and functional devices fabricated using complementary metal-oxide-semiconductor-compatible mass manufacturing technologies. Taking both fine critical dimension and mass production into account, the platforms developed at the Institute of Microelectronics (IME), A*STAR using advanced 12-inch immersion lithography have been presented with details, including process flow and demonstrated optical functionalities. These developed platforms aim to drive the flat optics from lab to fab.

【 授权许可】

CC BY