Nanophotonics | |
Si metasurface half-wave plates demonstrated on a 12-inch CMOS platform | |
article | |
Yuan Dong1  Yanyan Zhou1  Ting Hu1  Qize Zhong1  Vladimir Bliznetsov1  Shiyang Zhu1  Qunying Lin1  Dao Hua Zhang2  Yuandong Gu1  Navab Singh1  Zhengji Xu1  Nanxi Li1  Jinchao Tong2  Yuan Hsing Fu1  | |
[1] Institute of Microelectronics, Agency for Science, Technology and Research (A*STAR);School of Electrical and Electronic Engineering, Nanyang Technological University | |
关键词: flat optics; metasurface; polarization control; waveplate; | |
DOI : 10.1515/nanoph-2019-0364 | |
学科分类:社会科学、人文和艺术(综合) | |
来源: De Gruyter | |
【 摘 要 】
Half-wave plate (HWP) is one of the key polarization controlling devices in optical systems. The conventional HWPs based on birefringent crystals are inherently bulky and difficult to be monolithically integrated with other optical components. In this work, metasurface-based HWPs with high compactness are demonstrated on a 12-inch silicon complementary metal-oxide-semiconductor platform. Three-dimensional finite difference time domain simulation is used to design the nanostructure and investigate the impact of fabrication process variation on the device performance. In addition, the cross- and co-polarization transmittance ( T cross and T co ) of the HWPs located at different wafer locations are characterized experimentally. The peak T cross and valley T co values of 0.69 ± 0.053 and 0.032 ± 0.005 are realized at the wavelength around 1.7 μm, respectively. This corresponds to a polarization conversion efficiency of 95.6% ± 0.8%.
【 授权许可】
CC BY
【 预 览 】
Files | Size | Format | View |
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RO202107200003514ZK.pdf | 989KB | download |