Increased oxidative damage to all DNA bases in patients with type II diabetes mellitus

FEBS Letters

Rehman, Almas¹  Möller, Wenke³  Pereira, Paulo²  Halliwell, Barry¹  Nourooz-Zadeh, Jaffar⁴  Tritschler, Hans³ 

[1] International Antioxidant Research Centre, Pharmacology Group, King's College, Manresa Road, London SW3 6LX, UK;Department of Ophthalmology and Visual Science, Biomedical Institute for Research in Light and Image, Coimbra, Portugal;Asta Medica, Weismullerstrasse 45, 6000 Frankfurt am Main, Germany;Centre for Clinical Pharmacology and Therapeutic Toxicology, Department of Medicine, University College, 5 University Street, London WC1E 6JJ, UK

关键词: Diabetes;    Oxidative stress;    DNA damage;    Hydroxyl radical;   

DOI  :  10.1016/S0014-5793(99)00339-7

学科分类：生物化学/生物物理

来源: John Wiley & Sons Ltd.

【 摘 要 】

Gas chromatography-mass spectrometry was used to measure the oxidative DNA damage in diabetic subjects and controls. Levels of multiple DNA base oxidation products, but not DNA base de-amination or chlorination products, were found to be elevated in white blood cell DNA from patients with type II diabetes as compared with age-matched controls. The chemical pattern of base damage is characteristic of that caused by an attack on DNA by hydroxyl radical. An increased formation of the highly reactive hydroxyl radical could account for many of the reports of oxidative stress in diabetic subjects. There was no evidence of an increased DNA damage by reactive nitrogen or chlorine species.

【 授权许可】

Unknown