Bulletin of the Korean chemical society | |
Synthesis of Novel Platinum Precursor and Its Application to Metal Organic Chemical Vapor Deposition of Platinum Thin Films | |
Jinkwon Kim1  Min-Jung Park1  Sun Sook Lee1  Ki-Seok An1  Taek-Mo Chung1  Ho-Min Lee1  Chang Gyoun Kim1  Jong-Heun Lee1  | |
关键词: Platinum; Precursor; MOCVD; Aminoalkoxide; Thin films; | |
DOI : | |
学科分类:化学(综合) | |
来源: Korean Chemical Society | |
【 摘 要 】
A novel platinum aminoalkoxide complex, Pt(dmamp)2 has been prepared by the reaction of cis-(py)2PtI2 with two equivalents of Na(dmamp) (dmamp = 1-dimethylamino-2-methyl-2-propanolate). Single-crystal X-ray crystallographic analysis shows that the Pt(dmamp)2 complex keeps a square planar geometry with each two nitrogen atoms and two oxygen atoms having trans configuration. Platinum films have been deposited on TaN/ Ta/Si substrates by metal organic chemical vapor deposition (MOCVD) using Pt(dmamp)2. As-deposited platinum thin films did not contain any appreciable amounts of impurities except a little carbon. As the deposition temperature was increased, the films resistivity and deposition rate increased. The electrical resistivity (13.6 �? ヘcm) of Pt film deposited at 400 oC is a little higher than the bulk value (10.5 �? ヘcm) at 293 K. The chemical composition, crystalline structure, and morphology of the deposited films were investigated by X-ray photoelectron spectroscopy, X-ray diffraction, and atomic force microscopy.
【 授权许可】
Unknown
【 预 览 】
Files | Size | Format | View |
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RO201912010241079ZK.pdf | 200KB | download |