Magnetron deposition of TCO films using ion beam

12th International Conference on Gas Discharge Plasmas and Their Applications

Asainov, O.^1 ; Umnov, S.^1 ; Chinin, A.^1

Physical Technical Institute, Tomsk Polytechnic University, Tomsk, Russia^1

关键词: Argon ion;    Glass substrates;    Irradiation time;    Magnetron deposition;    Optical and electrical properties;    Oxygen partial pressure;    Reactive magnetron sputtering;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/652/1/012046/pdf
DOI  :  10.1088/1742-6596/652/1/012046

来源: IOP

【 摘 要 】

Thin films of tin oxide (TO) were deposited on the glass substrates at room temperature using reactive magnetron sputtering at various oxygen partial pressures. After the deposition the films were irradiated with argon ions beam. The change of the optical and electrical properties of the films depending on the irradiation time was studied. Films optical properties in the range of 300-1100 nm were investigated by photometry as well as their structural properties were studied using X-ray diffraction. Diffractometric research showed that the films, deposited on a substrate, have a crystal structure, and after argon ions irradiation they become quasi-crystalline (amorphous). It was found that the transmission increases proportionally with the irradiation time, but the surface resistance -disproportionally.