Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency

26th Symposium on Plasma Sciences for Materials

物理学;材料科学

Hashimoto, Y.^1 ; Toko, S.^1 ; Yamashita, D.^1 ; Seo, H.^1 ; Kamataki, K.^1 ; Itagaki, N.^1 ; Koga, K.^1 ; Shiratani, M.^1

Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan^1

关键词: a-Si:H;    Amorphous silicon nanoparticles;    Cluster removal;    Cluster-eliminating filter;    Hydrogen contents;    Si-H bonds;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/518/1/012007/pdf
DOI  :  10.1088/1742-6596/518/1/012007

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

We have developed a cluster-eliminating filter which reduces amount of amorphous silicon nanoparticles (clusters) incorporated into a-Si:H films. We have measured film thickness dependence of a ratio of a hydrogen content associated with Si-H2 bonds (CSiH2) to that with Si-H bonds (CSiH) as a parameter of the filter gap (dgap). The cluster removal efficiency increases with decreasing dgap. CSiH2 and the ratio of CSiH2 to CSiH decrease with increasing the film thickness, suggesting the amount of incorporated clusters is high near the interface between the film and the substrate.