Automated unit of the chemical wet etching

7th International Conferences on Physics and Technology of Nanoheterostructure Microwave Electronics: Mokerov Readings 2016;8th International Conferences on Physics and Technology of Nanoheterostructure Microwave Electronics: Mokerov Readings 2017

Sukhoroslova, Yu V.^1 ; Veselov, D.S.^1 ; Voronov, Yu A.^1

National Research Nuclear University MEPhI, Moscow Engineering Physics Institute, Kashirskoe shosse 31, Moscow

115409, Russia^1

关键词: Alkaline etchants;    Automated units;    Chemical wet etching;    Etched surface;    Experimental modeling;    Reaction chambers;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/475/1/012005/pdf
DOI  :  10.1088/1757-899X/475/1/012005

来源: IOP

【 摘 要 】

This paper is devoted to the development of wet etching unit and its control system. The experimental model represents the reaction chamber, equipped with the stirrer and steam-gas condenser, located inside the heated chamber. The unit is also equipped with heat-insulated reservoirs for preheating of etchants and water. The control system provides automated supplying of liquids into the reaction chamber. This allows realizing multistage etching in single technological cycle with etchants replacement and substrate washing, without its extraction from the reaction chamber. With using the unit was studied deep anisotropic etching of silicon in various alkaline etchants. Was revealed, that unit provides the uniformity of etched surface on the level of about 1 μm.