Preparation of copper thin film mask by sputtering technique assisted by polymer mask photolithography

2017 Global Conference on Polymer and Composite Materials

材料科学;化学

Pakpum, C.^1

Program in Applied Physics, Faculty of Science, Maejo University, Chiang Mai

50290, Thailand^1

关键词: Chemical wet etching;    Crystalline structure;    DC magnetron sputtering systems;    Energy dispersive x-ray spectrometers;    Metal electrodes;    Plasma dry etching;    Sputtering techniques;    X ray diffractometers;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/213/1/012023/pdf
DOI  :  10.1088/1757-899X/213/1/012023

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

This research aims to build cheaply homemade DC magnetron sputtering system for deposit metal thin films on substrate by assist of polymer mask photolithography. The metal thin film is able to use as a hard mask for patterning transfer via chemical wet etching or plasma dry etching process and it also can be used as a metal electrode in micrometre scale. Prepared copper thin films will be measured thickness by scanning electron microscope. Crystalline structure of the thin films will be examined by x-ray diffractometer. Elemental analysis contained in the films will be determined by energy dispersive x-ray spectrometer and morphology of the films will be revealed by scanning electron microscope.