学位论文详细信息
Confinement of microplasma in silicon trenches with widths as small as 2.5 μm | |
microplasma;nanoplasma;"Paschens curve";pd curve | |
Kim, Eung Soo ; Eden ; James G. | |
关键词: microplasma; nanoplasma; "Paschens curve"; pd curve; | |
Others : https://www.ideals.illinois.edu/bitstream/handle/2142/34514/Kim_Eung%20Soo.pdf?sequence=1&isAllowed=y | |
美国|英语 | |
来源: The Illinois Digital Environment for Access to Learning and Scholarship | |
【 摘 要 】
In plasma science, the ability to confine plasma in cavities with characteristic dimensions less than 1 μm would represent a major milestone. In this thesis, realization of microplasma inside channel devices with the characteristic dimensions of 5 μm and 2.5 μm is discussed. Data collected during the characterization of 5 μm devices are consistent with Paschen’s curve. Operating devices with a characteristic dimension of 2.5 μm are also introduced in this thesis. Finally, a few potential strategies for creating “nanoplasma” devices are discussed.
【 预 览 】
Files | Size | Format | View |
---|---|---|---|
Confinement of microplasma in silicon trenches with widths as small as 2.5 μm | 1029KB | download |