Ion Implantation Processing Technologies for Telecommunications Electronics.

Haynes, T. E.

Technical Information Center Oak Ridge Tennessee

关键词: Integrated circuits;    Ion implantation;    Manufacturing;    Ornl;    Silicon;   

RP-ID  :  DE2001755647

学科分类：工程和技术（综合）

美国|英语

来源: National Technical Reports Library

【 摘 要 】

The subject CRADA was a collaboration between Oak Ridge National Laboratory and Bell Laboratories, Lucent Technologies (formerly AT and T Bell Laboratories) to explore the development of ion implantation technologies for silicon integrated circuit (IC) manufacturing.