Ion Implantation Processing Technologies for Telecommunications Electronics

Haynes, T.E.

Oak Ridge National Laboratory

关键词: Ion Implantation;    36 Materials Science;    Ornl;    Manufacturing;    Integrated Circuits;   

DOI  :  10.2172/755647
RP-ID  :  C/ORNL94-0270
RP-ID  :  AC05-00OR22725
RP-ID  :  755647

美国|英语

来源: UNT Digital Library

【 摘 要 】

The subject CRADA was a collaboration between Oak Ridge National Laboratory and Bell Laboratories, Lucent Technologies (formerly AT and T Bell Laboratories) to explore the development of ion implantation technologies for silicon integrated circuit (IC) manufacturing.