Preparations for EUV Interferometry of the 0.3 NA MET Optic.

Technical Information Center Oak Ridge Tennessee

关键词: Interferometers;    Extreme ultraviolet radiation;    Optical systems;    Alignment;    Tests;   

RP-ID  :  DE2004819978

学科分类：工程和技术（综合）

美国|英语

来源: National Technical Reports Library

【 摘 要 】

An at-wavelength interferometer is being created for the measurement and alignment of the 0.3 numerical aperture Micro Exposure Tool projection optic at EUV wavelengths. The prototype MET system promises to provide early learning from EUV lithographic imaging down to 20-nm feature size. The threefold increase to 0.3 NA in the image-side numerical aperture presents several challenges for the extension of ultra-high-accuracy interferometry, including pinhole fabrication and the calibration and removal of systematic error sources.