Real-Time Characterization of Hot-Wire CVD Growth of Si:H Films using Spectroscopic Ellipsometry: Preprint.

Levi, D.

Technical Information Center Oak Ridge Tennessee

关键词: Meetings;    Thin films;    Silicon;    Chemical vapor deposition;    Ellipsometers;   

RP-ID  :  DE200215000068

学科分类：工程和技术（综合）

美国|英语

来源: National Technical Reports Library

【 摘 要 】

Presented at the 2001 NCPV Program Review Meeting: First application of real-time spectroscopic ellipsometry to in situ characterization of hot-wire CVD of hydrogenated-silicon thin films.