Direct to Digital Holography

Bingham, P.R. ; Tobin, K.W.

Oak Ridge National Laboratory

关键词: Ornl;    99 General And Miscellaneous;    Holography;    Design;    Illuminance;   

DOI  :  10.2172/940257
RP-ID  :  ORNL00-0606
RP-ID  :  DE-AC05-00OR22725
RP-ID  :  940257

美国|英语

来源: UNT Digital Library

【 摘 要 】

In this CRADA, Oak Ridge National Laboratory (ORNL) assisted nLine Corporation of Austin, TX in the development of prototype semiconductor wafer inspection tools based on the direct-to-digital holographic (DDH) techniques invented at ORNL. Key components of this work included, development of the first prototype named the Visible Alpha Tool (VAT) that uses visible spectrum illumination of 532 nm, assist in design of second prototype tool named the DUV Alpha Tool (DAT) using deep UV (266 nm) illumination, and continuing support of nLine in the development of higher throughput commercial tools.