Direct to Digital Holography

Bingham, P.R. ; Tobin, K.W.

Oak Ridge National Laboratory

关键词: Holography;    Testing;    Ornl;    99 General And Miscellaneous;    Detection;   

DOI  :  10.2172/932949
RP-ID  :  C/ORNL-0560
RP-ID  :  DE-AC05-00OR22725
RP-ID  :  932949

美国|英语

来源: UNT Digital Library

【 摘 要 】

In this Cooperative Research and Development Agreement (CRADA), Oak Ridge National Laboratory (ORNL) assisted nLine Corporation of Austin, TX in the development of prototype semiconductor wafer inspection tools based on the direct-to-digital holographic (DDH) techniques invented at ORNL. Key components of this work included, testing of DDH for detection of defects in High Aspect Ratio (HAR) structures, development of image processing techniques to enhance detection capabilities through the use of both phase and intensity, and development of methods for autofocus on the DDH tools.