EUV reflectance characterization of the 94/304 ? flight secondary AIA mirror at beamline 6.3.2 of the Advanced Light Source

Soufli, R ; Spiller, E ; Aquila, A L ; Gullikson, E M ; Windt, D L

Lawrence Livermore National Laboratory

关键词: 99 General And Miscellaneous//Mathematics, Computing, And Information Science;    Mirrors;    36 Materials Science;    71 Classical And Quantumm Mechanics, General Physics;    Advanced Light Source;   

DOI  :  10.2172/928205
RP-ID  :  UCRL-TR-221611
RP-ID  :  W-7405-ENG-48
RP-ID  :  928205

美国|英语

来源: UNT Digital Library

【 摘 要 】

The AIA secondary flight mirror, previously coated at Columbia University with Mg/SiC for the 303.8 {angstrom} channel and Mo/Y for the 93.9 {angstrom} channel was characterized by means of EUV reflectance measurements at beamline 6.3.2 of the Advanced Light Source (ALS) synchrotron at LBNL on January 10, 2006. Paul Boerner (LMSAL) also participated in these measurements.