科技报告详细信息
Multilayer deposition and EUV reflectance characterization of 131 ? flight mirrors for AIA at LLNL | |
Soufli, R ; Robinson, J C ; Spiller, E ; Baker, S L ; Dollar, F J ; Gullikson, E M | |
Lawrence Livermore National Laboratory | |
关键词: Lawrence Livermore National Laboratory; 99 General And Miscellaneous//Mathematics, Computing, And Information Science; Mirrors; Specifications; 36 Materials Science; | |
DOI : 10.2172/928185 RP-ID : UCRL-TR-221612 RP-ID : W-7405-ENG-48 RP-ID : 928185 |
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美国|英语 | |
来源: UNT Digital Library | |
【 摘 要 】
Mo/Si multilayer coatings reflecting at 131 {angstrom} were deposited successfully on the AIA primary and secondary flight mirrors and on two coating witness Si wafers, on November 16, 2005, at LLNL. All coatings were characterized by means of EUV reflectance measurements at beamline 6.3.2 of the Advanced Light Source (ALS) synchrotron at LBNL, and were found to be well within specifications.
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