Fundamental Surface Reaction Mechanisms in Fluorocarbon Plasma-Based Processing: Final report

Oehrlein, Gottlieb S. ; Anderson, H. ; Cecchi, J. ; Graves, D.

University of Maryland

关键词: Dielectric Materials;    Verification Low Pressure Plasma Processing;    Processing;    70 Plasma Physics And Fusion Technology;    Plasma Diagnostics;   

DOI  :  10.2172/831085
RP-ID  :  NONE
RP-ID  :  FG02-00ER54608
RP-ID  :  831085

美国|英语

来源: UNT Digital Library

【 摘 要 】

This report provides a summary of results obtained in research supported by contract ''Fundamental Surface Reaction Mechanisms in Fluorocarbon Plasma-Based Processing'' (Contract No. DE-FG0200ER54608). In this program we advanced significantly the scientific knowledge base on low pressure fluorocarbon plasmas used for patterning of dielectric films and for producing fluorocarbon coatings on substrates. We characterized important neutral and ionic gas phase species that are incident at the substrate, and the processes that occur at relevant surfaces in contact with the plasma. The work was performed through collaboration of research groups at three universities where significantly different, complementary tools for plasma and surface characterization, computer simulation of plasma and surface processes exist. Exchange of diagnostic tools and experimental verification of key results at collaborating institutions, both experimentally and by computer simulations, was an important component of the approach taken in this work.