Plasma enhanced chemical vapor deposition silicon nitride for a high-performance lithium ion battery anode

JOURNAL OF POWER SOURCES

卷:269

Article

Yang, Jinho¹  de Guzman, Rhet C.²  Salley, Steven O.²  Ng, K. Y. Simon²  Chen, Bing-Hung³  Cheng, Mark Ming-Cheng¹ 

[1] Wayne State Univ, Dept Elect & Comp Engn, Detroit, MI 48202 USA

[2] Wayne State Univ, Dept Chem Engn & Mat Sci, Detroit, MI 48202 USA

[3] Natl Cheng Kung Univ, Dept Chem Engn, Tainan, Taiwan

关键词: Lithium ion battery;    Silicon anode;    Silicon nitride;    Composite anode;   

DOI  :  10.1016/j.jpowsour.2014.06.135

来源: Elsevier

【 摘 要 】

Silicon nitride thin films deposited by plasma enhanced chemical vapor deposition (PECVD) were evaluated for their performance as lithium ion battery anodes. PECVD is a mature technique in the semiconductor industry, but has been less utilized in battery research. We show that PECVD is a powerful tool to control the chemical composition of battery materials and its corresponding specific capacity. A 250 nm nitride anode was shown to have a stable reversible caPacity of 1800 mAh g(-1) with 86% capacity retention after 300 cycles. The capacity dropped for thicker films (1 mu m), where it retained 76% after 100 cycles. The high reversible capacity of the PECVD nitride anode was attributable-to a conductive Li3N matrix and excellent adhesion between PECVD films and copper current collectors. (C) 2014 Elsevier B.V. All rights reserved.

【 授权许可】

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