Analysis of periodic Mo/Si multilayers: Influence of the Mo thickness

SURFACE SCIENCE

卷:603

Article

Maury, H.¹  Andre, J. -M.¹  Le Guen, K.¹  Mahne, N.²  Giglia, A.²  Nannarone, S.²  Bridou, F.³  Delmotte, F.³  Jonnard, P.¹ 

[1] Univ Paris 06, Lab Chim Phys Mat & Rayonnement, CNRS, UMR 7614, F-75231 Paris 05, France

[2] TASC INFM Natl Lab, I-34012 Trieste, Italy

[3] Univ Paris Sud, CNRS, Inst Opt, Lab Charles Fabry, F-91127 Palaiseau, France

关键词: Superlattices;    Roughness;    X-ray emission;    X-ray reflection;    X-ray scattering;    Crystalline-amorphous interfaces;    Molybdenum;    Silicon;   

DOI  :  10.1016/j.susc.2008.12.002

来源: Elsevier

【 摘 要 】

A set of Mo/Si periodic multilayers is studied by non-destructive analysis methods. The thickness of the Si layers is 5 nm while the thickness of the Mo layers changes from one multilayer to another, from 2 to 4 nm. This enables us to probe the effect of the transition between the amorphous and crystalline state of the Mo layers near the interfaces with Si on the optical performances of the multilayers. This transition results in the variation of the refractive index (density variation) of the Mo layers, as observed by X-ray reflectivity (XRR) at a wavelength of 0.154 nm. Combining X-ray emission spectroscopy (XES) and XRR, the parameters (composition, thickness and roughness) of the interfacial layers formed by the interaction between the Mo and Si layers are determined. However, these parameters do not evolve significantly as a function of the Mo thickness. It is observed by diffuse scattering at 1.33 nm that the lateral correlation length of the roughness strongly decreases when the Mo thickness goes from 2 to 3 nm. This is due to the development of Mo crystallites parallel to the multilayer surface. (C) 2008 Elsevier B.V. All rights reserved.

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