X-ray reflectivity study on gold films during sputter deposition

SURFACE SCIENCE

卷:380

Article

Chiarello, RP ; You, H ; Kim, HK ; Roberts, T ; Kempwirth, RT ; Miller, D ; Gray, KE ; Vandervoort, KG ; Trivedi, N ; Phillpot, SR ; Zhang, QJ ; Williams, S ; Ketterson, JB

关键词: atomic force microscopy;    gold;    growth;    metallic films;    metallic surfaces;    models of non-equilibrium phenomena;    nonequilibrium thermodynamics and statistical mechanics;    polycrystalline surfaces;    polycrystalline thin films;    scanning tunneling microscopy;    silicon;    solid-gas interfaces;    sputtering;    surface roughening;    surface structure, morphology, roughness, and topography;    X-ray scattering, diffraction, and reflection;   

DOI  :  10.1016/S0039-6028(96)01406-9

来源: Elsevier

【 摘 要 】

We performed in-situ X-ray reflectivity measurements of gold films during sputter deposition on polished silicon substrates. The measurements were performed at several substrate temperatures and under two argon pressures. The gold surfaces were also examined by scanning tunneling microscopy after deposition to obtain their rear-space topographic images. These images were used to complement the X-ray reflectivity measurements in determining the effect of argon pressure on the gold surface and its height-height difference functions. An approximation for height-height difference functions was employed to analyze the X-ray reflectivity data. The measured interface width during growth followed a simple power law, consistent with recent theoretical results of dynamic scaling behavior. The scaling exponents, however, do not agree well with predictions based on some models in 2 + 1 dimensions. (C) 1997 Elsevier Science B.V.

【 授权许可】

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