Chemically modified Si(111) surfaces simultaneously demonstrating hydrophilicity, resistance against oxidation, and low trap state densities

SURFACE SCIENCE

卷:645

Article

Brown, Elizabeth S.¹  Hlynchuk, Sofiya¹  Maldonado, Stephen^1,2 

[1] Univ Michigan, Dept Chem, 930 N Univ, Ann Arbor, MI 48109 USA

[2] Program Appl Phys, 930 N Univ, Ann Arbor, MI USA

关键词: Surface chemistry;    Semiconductor;    Hydrophilic;    Silicon;   

DOI  :  10.1016/j.susc.2015.10.056

来源: Elsevier

【 摘 要 】

Chemically modified Si(111) surfaces have been prepared through a series of wet chemical surface treatments that simultaneously show resistance towards surface oxidation, selective reactivity towards chemical reagents, and areal defect densities comparable to unannealed thermal oxides. Specifically, grazing angle attenuated total reflectance infrared and X-ray photoelectron (XP) spectroscopies were used to characterize allyl-, 3,4-methylenedioxybenzene-, or 4-[bis(trimethylsily1)amino]phenyl-terminated surfaces and the subsequently hydroxylated surfaces. Hydroxylated surfaces were confirmed through reaction with 4-(trifluoromethyl)benzyl bromide and quantified by XP spectroscopy. Contact angle measurements indicated all surfaces remained hydrophilic even after secondary backfilling with CH3-groups. Surface recombination velocity measurements by way of microwave photoconductivity transients showed the relative defect-character of as-prepared and aged surfaces. The relative merits for each investigated surface type are discussed. (C) 2015 Elsevier B.V. All rights reserved.

【 授权许可】

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