SCRIPTA MATERIALIA | 卷:143 |
Sputtering in a high-flux plasma environment | |
Article | |
Doerner, R. P.1  | |
[1] UCSD, Energy Res Ctr, 9500 Gilman Dr, La Jolla, CA 92093 USA | |
关键词: Sputtering; Surface modification; Metals and alloys; Erosion; Plasma-surface interactions; | |
DOI : 10.1016/j.scriptamat.2017.06.045 | |
来源: Elsevier | |
【 摘 要 】
Sputtering yield measurements of metals using ion beam devices and high-flux plasma facilities are compared. During light inert gas bombardment, a general decrease in the sputtering yield is observed as the flux of energetic particles to the target increases. However, during heavy inert gas bombardment, the decrease is not observed and measurements agree with ion beams and binary collision approximation calculations. A potential cause, accumulation of gas atoms within the implantation zone, is hypothesized to be the culprit and various in-situ surface diagnostic techniques to measure the gas composition in the near surface of the metal targets are discussed. (C) 2017 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
【 授权许可】
Free
【 预 览 】
Files | Size | Format | View |
---|---|---|---|
10_1016_j_scriptamat_2017_06_045.pdf | 927KB | download |