Atomically resolved chemical ordering at the nm-thick TiO precipitate/matrix interface in V-4Ti-4Cr alloy

SCRIPTA MATERIALIA

卷:126

Article

Impagnatiello, A.^1,2  Hernandez-Maldonado, D.³  Bertali, G.²  Prestat, E.²  Kepaptsoglou, D.³  Ramasse, Q.³  Haigh, S. J.²  Jimenez-Melero, E.^1,2 

[1] Univ Manchester, Dalton Cumbrian Facil, Westlakes Sci & Technol Pk, Moor Row CA24 3HA, England

[2] Univ Manchester, Sch Mat, Manchester M13 9PL, Lancs, England

[3] SuperSTEM Lab, STFC Daresbury Campus,Keckwick Lane, Daresbury WA4 4AD, England

关键词: Refractory metal;    Crystalline oxides;    Lattice defects;    High-resolution electron microscopy;    Nuclear fusion reactor;   

DOI  :  10.1016/j.scriptamat.2016.08.016

来源: Elsevier

【 摘 要 】

We have used advanced analytical electron microscopy to characterise the local structure and chemistry at the interface between nm-thick TiO precipitates and the V-based matrix in a V-4Ti-4Cr alloy. Our results reveal the presence of an intergrowth between the fcc TiO and bcc vanadium structures, with a repeat lattice distance that equals 2.5 times the vanadium lattice parameter along the c-axis. Our atomic resolution analysis of the interface will impact the mechanistic understanding of its interaction with interstitials and radiation-induced lattice defects, and consequently trigger the development of improved alloy structures with interfaces engineered for enhanced radiation tolerance. (C) 2016 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

【 授权许可】

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