Detection of radical species produced by catalytic decomposition of H2, O2 and their mixtures on heated Ir surfaces

THIN SOLID FILMS

卷:517

Article; Proceedings Paper

Umemoto, Hironobu¹  Kusanagi, Hiroki¹  Nishimura, Kazuaki²  Ushijima, Mitsuru² 

[1] Shizuoka Univ, Fac Engn, Naka Ku, Hamamatsu, Shizuoka 4328561, Japan

[2] Tokyo Electron LTD, FPD Div, Minato Ku, Tokyo 1078481, Japan

关键词: Catalytic chemical vapor deposition;    Hot-wire chemical vapor deposition;    Iridium;    Oxygen;    Hydrogen;    Atomic oxygen;    Atomic hydrogen;    OH radical;   

DOI  :  10.1016/j.tsf.2009.01.020

来源: Elsevier

【 摘 要 】

Efficient production of H atoms, O atoms and OH radicals was confirmed by laser spectroscopic measurements in the catalytic decomposition of H-2, O-2 and their mixtures on a heated It filament No change in electric resistivity was observed when the filament was kept at 2350 K in the presence of 1.0 Pa of pure O-2, showing that oxidation is minor. Arrhenius-type temperature dependences were observed for the densities of H (O) atoms in pure H-2 (O-2) systems. In the H-2/O-2 mixed system, the H-atom density was almost independent of the O-2 partial pressure, although the O-atom and OH-radical densities increased with the O-2 pressure. These O-2 pressure dependences are completely different from those observed for W. It is less poisoned by O-2 compared to W. In addition, direct production of H2O molecules on It surfaces must take place besides the production of radical species. (C) 2009 Elsevier B.V. All rights reserved.

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