Gas phase and surface kinetics in plasma and hot filament-enhanced catalytic chemical vapor deposition of carbon nanostructures

THIN SOLID FILMS

卷:517

Article; Proceedings Paper

Le Normand, F.¹  Gulas, M.^1,2  Veis, P.²  Cojocaru, C. S.³  Bouree, J. E.³ 

[1] Univ Strasbourg, CNRS, Inst Phys & Chim Mat Strasbourg, Grp Surfaces & Interfaces,UMR 7504, F-67034 Strasbourg 2, France

[2] Comenius Univ, Dept Expt Phys, Fac Math Phys & Informat, Bratislava 84215, Slovakia

[3] Ecole Polytech, Phys Interfaces & Couches Minces Lab, CNRS, UMR 7647, F-91128 Palaiseau, France

关键词: Hot-wire chemical vapor deposition;    Carbon nanotubes;    Gas phase kinetics;    Surface kinetics;   

DOI  :  10.1016/j.tsf.2009.01.079

来源: Elsevier

【 摘 要 】

Simulations of the gas phase chemistry (C2H2/H-2) coupled with surface reactions for the catalytic growth of carbon nanostructures (nanotubes/nanofibers), using different activation modes of catalytic chemical vapor deposition (CCVD) process, are presented. Deposits issued from thermal CCVD, hot-filament CCVD, plasma-enhanced CCVD and plasma-enhanced combined with hot-filament CCVD are compared to simulations of the gas phase and surface kinetics. The influence of the activation elements is described in detail. According to these simulations taking into account optical emission spectroscopy data, gas phase composition and linear growth rate of tubular nanostructures are predicted in good agreement with the experimental observations. (C) 2009 Published by Elsevier B.V.

【 授权许可】

Free