Technological solution for the automatic replacement of the catalytic filaments in HWCVD

THIN SOLID FILMS

卷:575

Article

Nos, O.¹  Frigeri, P. A.¹  Bertomeu, J.¹ 

[1] Univ Barcelona, Dept Fis Aplicada & Opt, E-08028 Barcelona, Spain

关键词: Hot wire chemical vapor deposition;    Catalytic chemical vapor deposition;    Silicon;    Filament lifetime;    Filament replacement;   

DOI  :  10.1016/j.tsf.2014.10.010

来源: Elsevier

【 摘 要 】

The degradation of the catalytic filaments is the main factor limiting the industrial implementation of the hot wire chemical vapor deposition (HWCVD) technique. Up to now, no solution has been found to protect the catalytic filaments used in HWCVD without compromising their catalytic activity. Probably, the definitive solution relies on the automatic replacement of the catalytic filaments. In this work, the results of the validation tests of a newapparatus for the automatic replacement of the catalytic filaments are reported. The functionalities of the different parts have been validated using a 0.2 mm diameter tungsten filament under mu c-Si: H deposition conditions. (C) 2014 Elsevier B.V. All rights reserved.

【 授权许可】

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