Stability to moisture of hexagonal boron nitride films deposited on silicon by RF magnetron sputtering

THIN SOLID FILMS

卷:642

Article

Quan, Haiyan¹  Wang, Xin¹  Zhang, Li¹  Liu, Nian¹  Feng, Shuang²  Chen, Zhanguo¹  Hou, Lixin³  Wang, Qi¹  Liu, Xiuhuan⁴  Zhao, Jihong¹  Gao, Yanjun¹  Jia, Gang¹ 

[1] Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, 2699 Qianjin St, Changchun 130012, Jilin, Peoples R China

[2] Qiqihar Univ, Sch Commun & Elect Engn, 42 Wenhua St, Qiqihar 161006, Peoples R China

[3] Jilin Agr Univ, Coll Informat & Technol, 2888 Xincheng St, Changchun 130118, Jilin, Peoples R China

[4] Jilin Univ, Coll Commun Engn, 5372 Nanhu Rd, Changchun 130012, Jilin, Peoples R China

关键词: Hexagonal boron nitride;    Thin films;    Radio frequency magnetron sputtering;    Stability to moisture;   

DOI  :  10.1016/j.tsf.2017.09.032

来源: Elsevier

【 摘 要 】

We deposited hBN films on silicon substrates by RF magnetron sputtering, and investigated the stability of the hBN films to the moisture. The hBN films including a large quantity of oxygen impurities were apt to be attacked by water vapor, and the hydrolytic process of the hBN films was studied by FTIR spectra. According to the analysis of FTIR, the main reason for the hydrolysis is the existence of boron oxides in hBN films, and the result of the hydrolysis is the formation of boric acid crystals. We sintered the hBN targets at high temperature in order to prevent oxygen from entering into the hBN films. Both FTIR and XPS results show that the hBN films have a good waterproof performance after our technology improvements because of the limit to oxygen impurity. Finally, pure and stable hBN films were obtained successfully.

【 授权许可】

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