Characteristics of RF Magnetron Sputtered VO2 Thin Films for Potential Applications of Solar Control Coatings

4th International Conference on Manufacturing, Material and Metallurgical Engineering

Muslim, Noormariah^1 ; Soon, Ying Woan^1 ; Voo, Nyuk Yoong^1

Physical and Geological Sciences, Faculty of Science, Universiti Brunei Darussalam, Jalan Tungku Link, Gadong

BE 1410, Brunei^1

关键词: Low surface roughness;    Radio frequency magnetron sputtering;    Rf sputtering power;    Single orientations;    Solar control coatings;    Substrate temperature;    Thermochromic properties;    Visible and near infrared;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/538/1/012022/pdf
DOI  :  10.1088/1757-899X/538/1/012022

来源: IOP

【 摘 要 】

Properties of vanadium dioxide or vanadia (VO2) thin films prepared using radio frequency (RF) magnetron sputtering with a pure VO2 target were analysed. The properties consisted of crystal structure, surface topography, surface morphology as well as optical and thermochromic properties of VO2 thin films. The deposition was conducted in an argon atmosphere of flow rate of 30 sccm, substrate temperature of 500 °C and RF sputtering power of 100 W. The film, which was deposited with film thickness of 50 nm, exhibited a single orientation of (110) orientation. The film surface featured quite homogeneous and continuous surface topography, and spherical-like grains that represented grains in VO2(M) phase. The film had low surface roughness resulting in quite high optical transmittance and relatively low optical reflectance, at room temperature throughout visible and near-infrared regions. Meanwhile, the film also showed a phase transition at ∼65.0 °C with hysteresis width of 38 °C.