Selective sensitivity of ellipsometry to magnetic nanostructures

THIN SOLID FILMS

卷:519

Article; Proceedings Paper

Postava, K.¹  Hrabovsky, D.¹  Hamrlova, J.¹  Pistora, J.¹  Wawro, A.²  Baczewski, L. T.²  Sveklo, I.³  Maziewski, A.³ 

[1] Tech Univ Ostrava, Dept Phys, Ostrava 70833, Czech Republic

[2] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland

[3] Univ Bialystok, Fac Phys, Magnetism Lab, PL-15424 Bialystok, Poland

关键词: Generalized ellipsometry;    Magneto-optical ellipsometry;    Material sensitivity;    Magnetic nanostructures;   

DOI  :  10.1016/j.tsf.2010.11.073

来源: Elsevier

【 摘 要 】

Magneto-optic (MO) ellipsometry of ferromagnetic materials is extremely sensitive to ultra-thin films, multilayers, and nanostructures. It gives a possibility to measure all components of the magnetization vector in the frame of the magneto-optic vector magnetometry and enables us to separate magnetic contributions from different depths and materials in nanostructures, which is reviewed in this article. The method is based on ellipsometric separation using the selective MO Kerr effect. The figure of merit used to quantify the ellipsometric selectivity to magnetic nanostructures is defined on the basis of linear matrix algebra. We show that the method can be also used to separate MO contributions from areas of the same ferromagnetic materials deposited on different buffer layers. The method is demonstrated using both: (i) modeling of the MO ellipsometry response and (ii) MO measurement of ultra-thin Co islands epitaxially grown on self-organized gold islands on Mo/Al2O3 buffer layer prepared using the molecular beam epitaxy at elevated temperatures. The system is studied using longitudinal (in-plane) and polar (perpendicular) MO Kerr effects. (C) 2011 Elsevier B.V. All rights reserved.

【 授权许可】

Free